Fundamentals and Applied Aspects
edited by Rajiv Kohli
Developments in Surface Contamination and Cleaning addresses the sources, detection, characterization and removal of both film-type and particulate contaminants, as well as ways to prevent surfaces from being contaminated.
A number of techniques to monitor the level of cleanliness are also discussed and a special emphasis is placed on the behavior of nanoscale particles throughout the book.
Features:
- Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical
- A single source document addressing everything from the sources of contamination to their removal and prevention
- Well referenced and profusely illustrated
Contents
Fundamentals
- The Physical Nature of Very, Very Small Particles and its Impact on Their Behavior
- Elucidating the Fundamental Interactions of Very Small Particles: Ultrafast Science
- Transport and Deposition of Aerosol Particles
- Relevance of Particle Transport in Surface Deposition and Cleaning
- Tribological Implications of Particles
- Airborne Molecular Contamination: Contamination on Substrates and the Environment in Semiconductors and Other Industries
- Aspects of Particle Adhesion and Removal
- Relevance of Electrostatic Discharge Controls to Particle Contamination in Cleanroom Environments
Characterization of Surface Contaminants
- Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
- Surface Analysis Methods for Contaminant Identification
- Ionic Contamination and Analytical Techniques for Ionic Contamination
- Relevance of Colorimetric Interferometry for Thin Surface Film Contaminants
- Wettability Techniques to Monitor the Cleanliness of Surfaces
Methods for Removal of Surface Contamination
- The Use of Surfactants to Enhance Particle Removal from Surfaces
- Cleaning with Solvents
- Removal of Particles by Chemical Cleaning
- Cleaning Using High-Speed Impinging Jet
- Microabrasive Precision Cleaning and Processing Technology
- Cleaning Using Argon/Nitrogen Cryogenic Aerosols
- Carbon Dioxide Snow Cleaning
- Coatings for Preventing or Deactivation of Biological Contaminants
- A Detailed Study of Semiconductor Wafer Drying
Index
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