Fundamentals, Etching, Deposition and Surface Interactions
edited by
Stephen M. Rossnagel et al
The field of plasma-based thin film processing has grown rapidly over the past two decades. The technologies discussed in this book are the basis for the revolutionary increase in computer capabilities, as well as for such applications as tool coatings, food packaging, and architectural coatings on skyscraper windows.
Handbook of Plasma Processing Technology is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
The chapters provide a more concise view of the level of understanding of the field today, without wading through the entire history of each field.
Contents
- General Information
- Techniques for IC Processing
- Plasma Fundamentals
- Introduction to Plasma Concepts and Discharge Configurations
- Fundamentals of Sputtering and Reflection
- Bombardment-Induced Compositional Change with Alloys, Oxides, Oxysalts, and Halides
- Non-Reactive Plasma Processes
- RF Diode Sputter Etching and Deposition
- Magnetron Plasma Deposition Processes
- Broad Beam Ion Sources
- Reactive Plasma Processes
- Reactive Ion Etching
- Reactive Sputter Deposition
- Plasma Enhanced Chemical Vapor Deposition of Thin Films for Microelectronics
- Electron Cyclotron Resonance Microwave Discharges for Etching and Thin Film Deposition
- Hollow Cathode Etching and Deposition
- Related Plasma Processes
- Ion Plating
- Ionized Cluster Beam (ICB) Deposition Techniques
- The Activated Reactive Evaporation (ARE) Process
- Formation of Thin Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)
- Selective Bias Sputter Deposition
- Vacuum Arc-Based Processing
- Plasma Surface Interactions
- Ion-Surface Interactions: General Understanding
- Ion Assisted Deposition
- Microstructural Control of Plasma-Sputtered Refractory Coatings
Index