Handbook of Semiconductor Wafer Cleaning Technology:
Science, Technology
and Applications

edited by Werner Kern

This book brings together into one volume all pertinent knowledge on semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject.

Handbook of Semiconductor Wafer Cleaning Technology provides the first comprehensive and up-to-date coverage of this rapidly evolving field. Its thirteen chapters were written by nineteen scientists who are recognized experts.

The depth and breadth of the material should appeal to those new in the field as well as to experienced professionals. The volume is intended to serve as a handbook for practitioners and professionals in the field.

Contents

1. Introduction and Overview
   1. Overview and Evolution of Semiconductor Wafer Contamination and Cleaning Technology
   2. Trace Chemical Contamination on Silicon Surfaces

2. Wet-Chemical Processes
   3. Aqueous Cleaning Processes
   4. Particle Deposition and Adhesion

3. Dry Cleaning Processes
   5. Overview of Dry Wafer Cleaning Processes
   6. Ultraviolet-Ozone Cleaning of Semiconductor Surfaces
   7. Vapor Phase Wafer Cleaning Technology
   8. Remote Plasma Processing for Silicon Wafer Cleaning

4. Analytical and Control Aspects
   9. Measurement and Control of Particulate Contaminants
   10. Silicon Surface Chemical Composition and Morphology
   11. Analysis and Control of Electrically Active Contaminants by Surface Charge Analysis
   12. Ultratrace Impurity Analysis of Silicon Surfaces by SIMS and TXRF Methods

5. Conclusions and Future Directions
   13. Future Directions

Index

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