Handbook of Physical Vapor Deposition (PVD) Processing covers all aspects of Physical Vapor Deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to postdeposition processing.

The emphasis of Handbook of Physical Vapor Deposition (PVD) Processing is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications.

Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest.

Extensive references allow the reader to pursue subjects in greater detail if desired.

Handbook of Physical Vapor Deposition (PVD) Processing is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field.

Contents:

1. Introduction
2. Substrate ("Real") Surfaces and Surface Modification
3. The Low-Pressure Gas and Vacuum Processing Environment
4. The Low-Pressure Plasma Processing Environment
5. Vacuum Evaporation and Vacuum Deposition
6. Physical Sputtering and Sputter Deposition (Sputtering)
7. Arc Vapor Deposition
8. Ion Plating and Ion Beam Assisted Deposition
9. Atomistic Film Growth and Some Growth-Related Film Properties
10. Film Characterization and Some Basic Film Properties
11. Adhesion and Deadhesion
12. Cleaning
13. External Processing Environment

click here to see books • videos • cd-roms of related interest

ORDER NOW Handbook of Physical Vapor Deposition (PVD) Processing Film Formation, Adhesion, Surface Preparation and Contamination Control by Donald M. Mattox 917 pages • $248.00 + shipping Texas residents please add 6.75 % sales tax