edited by Tadahiro Ohmi
Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays.
Features:
- Provides detailed discussion of new and advanced technologies for semiconductor and display manufacturing
- Demonstrates radical-reaction-based technologies based on microwave-excited very-low-electron-temperature high-density plasma equipment
- Explores how these new technologies overcome traditional limits and lead to flexible, lower-cost device manufacturing
- Includes more than 500 tables and illustrations along with abundant references to more in-depth information
Contents
- Surface Chemical Electronics at the Semiconductor Surface
- Principles of Semiconductor Device Wet Cleaning
- High-Performance Wet-Cleaning Technology
- Etching of Various SiO2
- Silicon Etching
- Chemical Composition Control Technology
- Wet Vapor Resist Stripping Technology
- Antistatic Technology
- Chemical Waste Reclamation Technology
- Ultrapure Water and Gas-Dissolved Water Supply System for Fluctuation-Free Facility
Index
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